Magnetic Hysteresis of Co/Si Multilayers
with Variable Thickness Parameters

V. O. Vas’kovskiia, G. S. Patrinb, D. A. Velikanovb, P. A. Savina, A. V. Svalova,
A. A. Yuvchenko
a, and N. N. Shchegolevac

a Ural State University, pr. Lenina 51, Ekaterinburg, 620083 Russia

b Kirenskii Institute of Physics, Siberian Division, Russian Academy of Sciences,
Akademgorodok, Krasnoyarsk, 660036 Russia

c Institute of Metal Physics, Ural Division, Russian Academy of Sciences,
ul. S. Kovalevskoi 18, Ekaterinburg, 620041 Russia

Received April 10, 2006; in final form, September 12, 2006

Abstract—The magnetic properties of Co/Si multilayers with different thicknesses of Co (2–42 nm) and Si
(0.3–10 nm) layers produced by high-frequency ion sputtering have been studied. Peculiarities of the micro-
structure of multilayered films and regularities of their magnetization with varying the magnetic field (0–
500Oe) and temperature (4.2–300 K) have been determined. A conception of the partial interlayer mixing with
the formation of surface interfaces with a granular magnetic structure has been used for a model description of
the structural and chemical states and magnetic properties of the multilayers. The relative volume of interfaces
and parameters of their elements—granules—vary depending on the nominal magnitudes and relationship
between the layer thicknesses. This leads to specific hysteretic effects. The interlayer interaction of domain
walls is likely to play a certain role in the formation of the hysteretic properties.

PACS numbers: 75.70.Ak, 75.70.Ej

DOI: 10.1134/S0031918X07030088


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